Our patented precursors were specifically developed to simplify coating and densification processes using CVD (chemical vapor deposition) and CVI (chemical vapor infiltration).  Our CVD-4000 CVD polymer precursor offers unique capabilities for chemical vapor deposition.  These polymers produce High temperature anti-wear and anti-corrosion coatings.  They can be deposited at temperatures as low as 600°C, whereas most competing materials require high heat exposure at 1400°C for effective infiltration.  The precursors produce a highly pure stoichiometric silicon carbide ceramic.  Ceramic yields are more than 5 times greater than our competitor’s precursors, but our polymers do not produce any hazardous waste products.  Our CVD precursor has attracted strong interest from many companies for its unique safety and processing advantages.  Starfire’s CVD-2000 CVI precursor much more efficient when infiltrating fiber performs than conventional processes.  Our cost-effective CVD/CVI precursors reduce cycle times, decrease the energy required for infiltration, and has minimal impact on the environment.

Starfire® RD-189 - DMIPS

Starfire® Systems is in the early stages of application trials for Dimethylisopropylsilane (DMIPS) but it is showing excellent promise as the next generation precursor for chemical vapor deposition (CVD) of silicon carbide (SiC).  DMIPS has shown to be effective at atmospheric pressure in a standard hot-wall reactor and deposits in a controlled way at 850-875°C.  DMIPS forms no corrosive byproducts in the CVD process therefore this material has minimal environmental impact.  The handling, transfer, and storage of this material are relatively simple. 

Please click on the data sheet below to compare the chemistry and deposition conditions for DMIPS with those of CVD-4000, Starfire System's earlier CVD precursor for SiC.

STARFIRE® RD-189 - DMIPS Data Sheet